| Product Name: Halocarbon C318 - Octafluorocyclobutane C4F8 |
| Packing: 40L, 44L, 47L, 50L cylinder (GB, ISO, DOT) |
| Filling Content: 40kg/cyl |
| Items | Specifications |
| C4F8 | 99.9% | 99.999% |
| O2 | ≤80 ppmv | ≤1.0 ppmv |
| N2 | ≤300 ppmv | ≤3.0 ppmv |
| CO2 | ≤50ppmv | ≤0.5ppmv |
| CO | ≤30 ppmv | ≤0.5 ppmv |
| CH4 | ≤30 ppmv | ≤0.5 ppmv |
| H2O | ≤10 ppmv | ≤3.0 ppmv |
| Other Organics | ≤600 ppmv | ≤5.0 ppmv |
| Acidity as HCL | ≤1.0 ppmw | ≤0.1 ppmw |
|
| Transportation |
| DOT Shipping Name | Octafluorocyclobutane |
| DOT Classification | 2.2 |
| DOT Label | Nonflammable Gas |
| UN Number | UN 1976 |
| CAS | 115-25-3 |
| CGA/DISS/JIS | 660/716/W22-14L |
| Shipped as | Liquefield Gas |
|
| Technical Information |
| Cylinder State @ 21.1°C | Liquid |
| Flammable Limits In Air | Non-flammable |
| Auto Ignition Temperature (°C ) | - |
| Molecular Weight (g/mol) | 200.03 |
| Specific gravity (air =1) | 7.33 |
| Critical Temperature ( °C ) | 115.2 |
|
| Applications |
| Perfluorocyclobutane (C4F8) is used in semiconductor manufacturing as plasma etching of silicon dioxide (SiO2) or silicon layers. |
EN
CH
Phone：+86-757-81033032
position ：
