Product Name: Hydrogen Chloride HCL | ||
Packing: 40L, 44L, 47L, 50L cylinder (GB, ISO, DOT) | ||
Filling Content: 25kg/ cylinder | ||
Items | Specifications | |
HCl | 99.9% | 99.999% |
O2 | ≤10 ppmv | ≤ 0.5 ppmv |
N2 | ≤10.0 ppmv | ≤ 2.0 ppmv |
CO2 | ≤5.0 ppmv | ≤2.0 ppmv |
CO | ≤5.0 ppmv | ≤1.0 ppmv |
CH4 | ≤5.0 ppmv | ≤0.3 ppmv |
H2O | ≤2.0 ppmv | ≤1.0 ppmv |
Iron | ≤1.0 ppmv | |
Transportation | ||
DOT Shipping Name | Hydrogen Chloride, Anhydrous | |
DOT Classification | 2.3 | |
DOT Label | Poison Gas Inhalation Hazard Corrosive Gas | |
UN Number | UN 1050 | |
CAS No. | 7647-01-0 | |
CGA/DISS/JIS/BS341/DIN477 | 330/634/W26-14R/NO.6/NO.8 | |
Shipped as | Liquefied Gas | |
Technical Information | ||
Cylinder State @ 21.1°C | Liquid | |
Flammable Limits In Air | Non-flammable | |
Auto Ignition Temperature (°C ) | - | |
Molecular Weight (g/mol) | 36.461 | |
Specific gravity (air =1) | 1.19 | |
Critical Temperature ( °C ) | 51.54 | |
Critical Pressure ( psig ) | 1185 | |
Applications | ||
· In the electronics industry as carrier for non-volatile elements and in selective etching. · In semiconductor fabrication: etching of native oxide prior to epitaxial deposition; CVD reactor cleaning, moisture getter in CVD oxides. | ||